| 1. | Magnetron enhanced reactive ion etaching system
磁控管增强型反应性离子蚀刻系统
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| 2. | Blank detail specification for continuous wave magnetrons
连续波磁控管空白详细规范
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| 3. | Techniques of clinical linac magnetron replacement
医用直线加速器磁控管更换技术探讨
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| 4. | Research of unbalanced magnetron sputtering system
非平衡磁控溅射系统的研究
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| 5. | Blank detail specifications for pulsed magnetrons
脉冲磁控管空白详细规范
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| 6. | Detail specification for coail magnetron of type ckm - 2936
Ckm - 2936型同轴磁控管详细规范
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| 7. | Detail specification for pulse magnetron of type ckm - 6951
Ckm - 6951型脉冲磁控管详细规范
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| 8. | Pulased mode of inverted - magnetron cold - cathode gauge
一种反磁控冷阴极真空规的脉冲操作模式
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| 9. | Magnetron sputtering target source and sputtering procedure
磁控溅射靶源设计及溅射工艺研究
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| 10. | Anticoagulant property of tio2 thin films prepared by magnetron sputtering
2薄膜的抗凝血性能
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